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dc.contributor.authorYiğiterol, Fatih
dc.contributor.authorGüllü, Hasan Hüseyin
dc.contributor.authorBayraklı Sürücü, Özge
dc.contributor.authorYıldız, Dilber Esra
dc.date.accessioned2019-05-13T08:57:19Z
dc.date.available2019-05-13T08:57:19Z
dc.date.issued2018
dc.identifier.citationYigiterol, F., Güllü, H. H., Bayraklı, Ö., & Yıldız, D. E. (2018). Temperature-Dependent Electrical Characteristics of Au/Si 3 N 4/4H n-SiC MIS Diode. Journal of Electronic Materials, 47(5), 2979-2987.en_US
dc.identifier.issn0361-5235
dc.identifier.urihttps://doi.org/10.1007/s11664-018-6155-3
dc.identifier.urihttps://hdl.handle.net/11491/900
dc.description.abstractElectrical characteristics of the Au/Si3N4/4H n-SiC metal–insulator-semiconductor (MIS) diode were investigated under the temperature, T, interval of 160–400 K using current–voltage (I–V), capacitance–voltage (C- V) and conductance–voltage (G/ ?- V) measurements. Firstly, the Schottky diode parameters as zero-bias barrier height (? B 0) and ideality factor (n) were calculated according to the thermionic emission (TE) from forward bias I–V analysis in the whole working T. Experimental results showed that the values of ? B 0 were in increasing behavior with increasing T while n values decreased with inverse proportionality in n versus ? B 0 plot. Therefore, the non-ideal I–V behavior with inhomogeneous barrier height (BH) formation has been discussed under the assumption of Gaussian distribution (GD). From the GD of BHs, the mean BH was found to be about 1.40 eV with 0.1697 standard deviation and the modified Richardson constant A? of this diode was obtained as 141.65 A/cm2 K2 in good agreement with the literature (the theoretical value of A? is 137.21 A/cm2 K2). The relationship between ? B 0 and n showed an abnormal I–V behavior depending on T, and it was modeled by TE theory with GD of BH due to the effect in inhomogeneous BH at the interface. Secondly, according to Cheung’s model, series resistance, RS values were calculated in the T range of 160–400 K and these values were found to decrease with increasing T. Finally, the density of interface states, Dit was calculated and the T dependence of energy distribution of Dit profiles determined the forward I- V measurements by taking into account the bias dependence of the effective BH, ? e and n. Dit were also calculated according to the Hill–Coleman method from C- V and G/ ?- V analysis. Furthermore, the variation of Dit as a function of frequency, f and T were determined. © 2018, The Minerals, Metals & Materials Society.en_US
dc.language.isoeng
dc.publisherSpringer New York LLCen_US
dc.relation.isversionof10.1007/s11664-018-6155-3en_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectGaussian Distributionen_US
dc.subjectSurface Stateen_US
dc.subjectMIS Diodeen_US
dc.subjectSeries Resistanceen_US
dc.titleTemperature-Dependent Electrical Characteristics of Au/Si3N4/4H n-SiC MIS Diodeen_US
dc.typearticleen_US
dc.relation.journalJournal of Electronic Materialsen_US
dc.departmentHitit Üniversitesi, Fen Edebiyat Fakültesi, Fizik Bölümüen_US
dc.identifier.volume47en_US
dc.identifier.issue5en_US
dc.identifier.startpage2979en_US
dc.identifier.endpage2987en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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