Aldırmaz, EmineTataroğlu, AdemDere, AyşegülGüler, MelekGüler, EmreKarabulut, AbdülkerimYakuphanoğlu, Fahrettin2019-05-132019-05-132019Aldırmaz, E., Tataroğlu, A., Dere, A., Güler, M., Güler, E., Karabulut, A., & Yakuphanoglu, F. (2019). Cu-Al-Mn shape memory alloy based Schottky diode formed on Si. Physica B: Condensed Matter, 560, 261-266.0921-4526https://doi.org/10.1016/j.physb.2018.12.024https://hdl.handle.net/11491/1052In this work, martensite was made over the wide temperature ranges and the two forms of martensite mor-phology in Cu85.41Al9.97Mn4.62shape memory alloy (SMA) were ??and ??martensite phases. The SMA wascharacterized by the use of X-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses. In order tofabricate the Schottky diode, Cu-Al-Mn alloy was used as a Schottky contact onp-type Si semiconductor sub-strate. Some of the crucial parameters for diodes such as ideality factor and barrier height values were obtainedfrom electrical measurements. Illumination-dependent measurements showed that the fabricated device presentsthe behaviors of photodiode and photoconducting. Besides, it is found that the fabricated diode's structure issensitive to illumination. Frequency-dependent measurements also indicated that the series resistance and in-terface state parameters are crucial to affect electrical characteristics of the fabricated diode. The experimentalresults showed that the fabricated Schottky device could be used in variety of optoelectronic applications.eninfo:eu-repo/semantics/closedAccessCu-Al-MnFrequency DependenceIllumination MeasurementSchottky DiodeShape Memory AlloyCu-Al-Mn shape memory alloy based Schottky diode formed on SiArticle56026126610.1016/j.physb.2018.12.024N/AQ2