Influence of Si3N4 layer on the electrical properties of Au/n-4H SiC diodes

dc.authorid0000-0003-2212-199X
dc.contributor.authorYiğiterol, Fatih
dc.contributor.authorGüllü, Hasan Hüseyin
dc.contributor.authorYıldız, Dilber Esra
dc.date.accessioned2019-05-10T09:39:46Z
dc.date.available2019-05-10T09:39:46Z
dc.date.issued2018
dc.departmentHitit Üniversitesi, Fen Edebiyat Fakültesi, Fizik Bölümü
dc.description.abstractIn this study, the effect of Si3N4 insulator layer on the electrical characteristics of Au/n-4H SiC diode was investigated. The current–voltage ( I?V ), capacitance–voltage ( C?V ) and conductance–voltage ( G/w?V ) measurements were carried out at room temperature condition. Under thermionic emission model, electrical parameters as zero-bias barrier height ( ?Bo ), ideality factor (n), interface states ( Dit ), and series ( Rs ) and shunt ( Rsh ) resistances were estimated from forward bias I?V analyses. The values of n and ?Bo were about 1.305 and 0.796 eV for metal–semiconductor (MS) rectifying diode, and 3.142 and 0.713 eV for metal–insulator–semiconductor (MIS) diode with the insertion of Si3N4 layer, respectively. Since the values of n were greater than the unity, the fabricated diodes showed non-ideal I?V behaviour. The energy distribution profile of Dit of the diodes was calculated by taking into account of the bias dependence of the effective barrier height ( ?e ) and Rs . The obtained Dit values with Rs are almost one order of magnitude lower than those without Rs for two diodes. According to Cheung’s model, Rs were calculated and these values were found in increasing behaviour with the contribution of Si3N4 insulator layer. In addition, the JR?V plot behaviours with linear dependence between ln( JR ) vs. V0.5 indicated that the dominant conduction mechanism in the reverse bias region was Schottky effect for both MS and MIS diodes. In the room temperature C?V measurements, different from the results of MIS diode, the values of C for MS diode was observed in decreasing behaviour from ideality with crossing the certain forward bias voltage point ( ? 2.5 V ). The decrease in the negative capacitance corresponds to the increase of G / w.
dc.identifier.citationYiğiterol, F., Güllü, H. H., Yıldız, D. E. (2018). Influence of Si3N4 layer on the electrical properties of Au/n-4H SiC diodes. Bulletin of Materials Science, 41(3).
dc.identifier.doi10.1007/s12034-018-1586-2
dc.identifier.issn0250-4707
dc.identifier.issue3en_US
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1007/s12034-018-1586-2
dc.identifier.urihttps://hdl.handle.net/11491/771
dc.identifier.volume41en_US
dc.identifier.wosqualityN/A
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherIndian Academy of Sciences
dc.relation.ispartofBulletin of Materials Science
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectConduction Mechanismen_US
dc.subjectInsulator Layeren_US
dc.subjectInterface Statesen_US
dc.subjectMISen_US
dc.subjectMSen_US
dc.subjectSi 3N 4 Layeren_US
dc.titleInfluence of Si3N4 layer on the electrical properties of Au/n-4H SiC diodes
dc.typeArticle

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